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TABLE OF CONTENTS

Volume 12 Issue 3 , Pages 145 - 236 (March 1998)

Special Issue: Thin Film Processing by Chemical Vapour Deposition

Issue Edited by R.M. Laine


Preface

Preface (p 145)
R. M. Laine
Published Online: Dec 4 1998 4:40AM
DOI: 10.1002/(SICI)1099-0739(199803)12:3<145::AID-AOC1687>3.0.CO;2-F

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Research Articles

Comparison of SnBr4 and di-n-butyl tin diacetate as laser-assisted chemical vapor deposition precursors for SnO2-based gas sensors (p 147-154)
Jeanne M. Hossenlopp, F. J. Lamelas,enneth Middleton, Jeffrey A. Rzepiela, Jason D. Schmidt, Aleksandar Zivkovic
Published Online: Dec 4 1998 4:40AM
DOI: 10.1002/(SICI)1099-0739(199803)12:3<147::AID-AOC687>3.0.CO;2-X

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Chemical vapor deposition of tungsten oxide (p 155-160)
Rein U.irss, Lamartine Meda
Published Online: Dec 4 1998 4:40AM
DOI: 10.1002/(SICI)1099-0739(199803)12:3<155::AID-AOC688>3.0.CO;2-Z

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MOCVD of rhodium, palladium and platinum complexes on fluidized divided substrates: Novel process for one-step preparation of noble-metal catalysts (p 161-172)
Jean-Cyrille Hierso, Philippe Serp, Roselyne Feurer, Philippealck
Published Online: Dec 4 1998 4:40AM
DOI: 10.1002/(SICI)1099-0739(199803)12:3<161::AID-AOC689>3.0.CO;2-6

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Evaluation of the simultaneous use of Cp2VMe2 and CpTiCl2N(SiMe3)2 as precursors to ceramic thin films containing titanium and vanadium: Towards titanium-vanadium carbonitride (p 173-187)
L. Valade, C. Danjoy, B. Chansou, E. Rivière, J.-L. Pellegatta, R. Choukroun, P. Cassoux
Published Online: Dec 4 1998 4:40AM
DOI: 10.1002/(SICI)1099-0739(199803)12:3<173::AID-AOC690>3.0.CO;2-P

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Low-temperature MOCVD of chromium carbonitride coatings from tetrakis(diethylamido)chromium and pyrolysis mechanism of this single-source precursor (p 189-199)
Francis Maury, Franco Ossola
Published Online: Dec 4 1998 4:40AM
DOI: 10.1002/(SICI)1099-0739(199803)12:3<189::AID-AOC691>3.0.CO;2-3

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Processing and properties of (Mo,Cr) oxycarbides from MOCVD (p 201-220)
Wen-Cheng J. Wei, Ming-Hung Lo
Published Online: Dec 4 1998 4:40AM
DOI: 10.1002/(SICI)1099-0739(199803)12:3<201::AID-AOC692>3.0.CO;2-T

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Trends in precursor design for conventional and aerosol-assisted CVD of high-Tc superconductors (p 221-236)
Liliane G. Hubert-Pfalzgraf, Hervé Guillon
Published Online: Dec 4 1998 4:40AM
DOI: 10.1002/(SICI)1099-0739(199803)12:3<221::AID-AOC693>3.0.CO;2-O

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