![]() Library / Journals / Wiley / Applied Organometallic ChemistryCopyright © 2009 John Wiley & Sons, Ltd. TABLE OF CONTENTSVolume 12 Issue 3 , Pages 145 - 236 (March 1998)Special Issue: Thin Film Processing by Chemical Vapour DepositionIssue Edited by R.M. LainePrefacePreface (p 145) Research ArticlesComparison of SnBr4 and di-n-butyl tin diacetate as laser-assisted chemical vapor deposition precursors for SnO2-based gas sensors (p 147-154) Chemical vapor deposition of tungsten oxide (p 155-160) MOCVD of rhodium, palladium and platinum complexes on fluidized divided substrates: Novel process for one-step preparation of noble-metal catalysts (p 161-172) Evaluation of the simultaneous use of Cp2VMe2 and CpTiCl2N(SiMe3)2 as precursors to ceramic thin films containing titanium and vanadium: Towards titanium-vanadium carbonitride (p 173-187) Low-temperature MOCVD of chromium carbonitride coatings from tetrakis(diethylamido)chromium and pyrolysis mechanism of this single-source precursor (p 189-199) Processing and properties of (Mo,Cr) oxycarbides from MOCVD (p 201-220) Trends in precursor design for conventional and aerosol-assisted CVD of high-Tc superconductors (p 221-236) |